SUBSTRATE HOLDING METHOD, SUBSTRATE HOLDING DEVICE, EXPOSURE DEVICE USING THE SAME, AND METHOD OF MANUFACTURING DEVICE
摘要
<P>PROBLEM TO BE SOLVED: To reduce a down time of an exposure device by determining the cause of suction trouble without installing a special detection device when a substrate is not normally sucked onto a temperature regulation means. <P>SOLUTION: This substrate holding method includes: a temperature regulation means to regulate the temperature of a substrate by sucking and holding the substrate; a drop prevention member for preventing the drop of the substrate from the temperature regulation means; a knocking-up pin including a suction mechanism and a vertical drive mechanism for transferring the substrate; and a control system for controlling the suction mechanism and the drive mechanism; and is used for holding the substrate and regulating the temperature thereof. The substrate holding method includes a determination process S12 of determining whether suction trouble is caused by the substrate having run on the drop prevention member when the suction trouble occurs in sucking and holding the substrate to the temperature regulation means. <P>COPYRIGHT: (C)2010,JPO&INPIT
