| 发明名称 |
Illumination aperture for optical lithography |
| 摘要 |
Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.
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| 申请公布号 |
US2010165317(A1) |
申请公布日期 |
2010.07.01 |
| 申请号 |
US20080319014 |
申请日期 |
2008.12.30 |
| 申请人 |
WALLACE CHARLES;TINGEY MATTHEW;SIVAKUMAR SWAMINATHAN |
发明人 |
WALLACE CHARLES;TINGEY MATTHEW;SIVAKUMAR SWAMINATHAN |
| 分类号 |
G03B27/72;G02B26/02 |
主分类号 |
G03B27/72 |
| 代理机构 |
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