发明名称 RESIN COMPOSITION, RESIN SPACER FILM, AND SEMICONDUCTOR DEVICE
摘要 The present invention provides a resin composition. The resin composition is used for a resin spacer provided in a semiconductor device. The semiconductor device comprises of a substrate, a semiconductor element mounted on an interposer so as to face the substrate, and the resin spacer provided between the substrate and the interposer or the semiconductor element for bonding them together in a state that a space is formed between the substrate and the semiconductor element. The resin composition comprises an alkali solubility resin, a photopolimerization resin, and a particulate filler. An average particle size of the particulate filler is in the range of 0.05 to 0.35 μm. An amount of the particulate filler contained in the resin composition is in the range of 1 to 40 wt %. Further, the present invention also provides a resin spacer film. The resin spacer film is constituted of the resin composition described above.
申请公布号 US2010164126(A1) 申请公布日期 2010.07.01
申请号 US20080601642 申请日期 2008.05.23
申请人 SUMITOMO BAKELITE COMPANY LIMITED 发明人 TAKAHASHI TOYOSEI;TAKAYAMA RIE
分类号 H01L23/31;C08K3/00 主分类号 H01L23/31
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