| 摘要 |
<p>A polishing liquid composition for magnetic-disk substrates which is capable of giving a polished substrate reduced in scratches, nanometer-order projection defects, and surface undulations. The polishing liquid composition for magnetic-disk substrates comprises a copolymer or a salt thereof, an abrasive material, and water, the copolymer having a structural unit derived from a monomer having a solubility in 100 g of 20ºC water of 2 g or less and a structural unit that has a sulfo group and having a saturated hydrocarbon chain as the main chain.</p> |
