发明名称 Verfahren zum Formen von Verdrahtung und Elektrode
摘要 There is provided a method for forming wiring or an electrode by coating a substrate with a composition comprising (A) a complex of an amine compound and a hydrogenated aluminum compound and (B) a titanium compound or a composition comprising the complex and (C) metal particles and subjecting the obtained coating film to heating and/or a light treatment. By the method, a film can be formed that uses a conductive film forming composition with which wiring and an electrode that can be suitably used for electronic devices can be formed easily and inexpensively.
申请公布号 DE602004027183(D1) 申请公布日期 2010.07.01
申请号 DE20046027183T 申请日期 2004.03.25
申请人 JSR CORP.;SHARP CORP. 发明人 YOKOYAMA, YASUAKI;YONEKURA, ISAMU;SATOH, TAKASHI;WAKASAKI, TAMAKI;TAKEUCHI, YASUMASA;ENDO, MASAYUKI
分类号 C23C18/02;H01B1/22;C23C18/06;C23C18/08;C23C18/10;C23C18/14;H01L21/288 主分类号 C23C18/02
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