发明名称 |
FABRICATION METHOD AND FABRICATION APPARATUS FOR FABRICATING METAL OXIDE THIN FILM |
摘要 |
Object To provide a technique for efficiently forming a metal oxide thin film made of zinc oxide or the like on a substrate at a low cost, without requiring a large amount of electrical energy. Means of Solution H2 gas and O2 gas or, H2O2 gas, is introduced into a catalytic reactor to make contact with a catalyst to generate H2O gas, and the H2O gas is jetted from the catalytic reactor to react with a metal compound gas, to thereby deposit a metal oxide thin film on a substrate and fabricate the metal oxide thin film.
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申请公布号 |
US2010166958(A1) |
申请公布日期 |
2010.07.01 |
申请号 |
US20080600665 |
申请日期 |
2008.05.16 |
申请人 |
NATIONAL UNIVERSITY CORPORATION NAGAOKA UNIVERSITY OF TECHNOLOGY;TOKYO ELECTRON LIMITED |
发明人 |
YASUI KANJI;NISHIYAMA HIROSHI;TSUKICHI MASATOSHI;INOUE YASUNORI;TAKATA MASASUKE |
分类号 |
C23C16/458;C23C16/00;C23C16/06 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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