发明名称 FABRICATION METHOD AND FABRICATION APPARATUS FOR FABRICATING METAL OXIDE THIN FILM
摘要 Object To provide a technique for efficiently forming a metal oxide thin film made of zinc oxide or the like on a substrate at a low cost, without requiring a large amount of electrical energy. Means of Solution H2 gas and O2 gas or, H2O2 gas, is introduced into a catalytic reactor to make contact with a catalyst to generate H2O gas, and the H2O gas is jetted from the catalytic reactor to react with a metal compound gas, to thereby deposit a metal oxide thin film on a substrate and fabricate the metal oxide thin film.
申请公布号 US2010166958(A1) 申请公布日期 2010.07.01
申请号 US20080600665 申请日期 2008.05.16
申请人 NATIONAL UNIVERSITY CORPORATION NAGAOKA UNIVERSITY OF TECHNOLOGY;TOKYO ELECTRON LIMITED 发明人 YASUI KANJI;NISHIYAMA HIROSHI;TSUKICHI MASATOSHI;INOUE YASUNORI;TAKATA MASASUKE
分类号 C23C16/458;C23C16/00;C23C16/06 主分类号 C23C16/458
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