发明名称 MEMS DEVICE WITH CONTROLLED GAS SPACE CHEMISTRY
摘要 A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.
申请公布号 US2010165314(A1) 申请公布日期 2010.07.01
申请号 US20040833527 申请日期 2004.04.28
申请人 DUNCAN WALTER M;JACOBS SIMON JOSHUA;DOUGLASS MICHAEL R;GALE RICHARD O 发明人 DUNCAN WALTER M.;JACOBS SIMON JOSHUA;DOUGLASS MICHAEL R.;GALE RICHARD O.
分类号 G03B27/54;G02B26/00;G03B27/42 主分类号 G03B27/54
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