发明名称 SEMICONDUCTOR MEMORY DEVICE INCLUDING CELL ISOLATION STRUCTURE USING NONACTIVE TRANSISTOR
摘要 <p>PURPOSE: A semiconductor memory device is provided to minimize a region in which a memory cell is formed by simplifying the pattern of a memory cell active region which is formed in a memory cell array. CONSTITUTION: A memory cell active region is formed on silicon on insulator semiconductor substrate(19). A floating body cell transistor is formed in the memory cell active region. Floating body cell transistors are formed in the memory cell active region. A non-active transistor for isolating cells is formed between the floating body cell transistors. The non-active transistor for isolating the cells is composed of a word-line(20), a source/drain(18), and a substrate region(19a). The non-active transistor is controlled in an off-state while a semiconductor memory device is operating.</p>
申请公布号 KR20100073871(A) 申请公布日期 2010.07.01
申请号 KR20080132653 申请日期 2008.12.23
申请人 HYNIX SEMICONDUCTOR INC. 发明人 HWANG, SANG MIN
分类号 H01L21/8247;H01L21/76;H01L27/115 主分类号 H01L21/8247
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