| 摘要 |
<p>PURPOSE: The interferometer of a reticle for a lithography process is provided to prevent the misalignment of an overlay by attaching a moving mirror which reflects a laser from a laser interferometer. CONSTITUTION: A reticle(10) comprises light source and an illuminating optical system. A reticle stage(20) maintains the reticle as a mask. A laser interferometer(30) measures the location of the reticle stage in real time. A moving mirror(15) is attached on the reticle attaching surface(25) of the reticle stage. The moving mirror is fixed on the lateral side of the x-axis and the y-axis of the reticle.</p> |
