发明名称 PLASMA PROCESSOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processor capable of preventing reaction products from sticking on an optical window of a view port for collecting plasma light in a chamber and capable of continuously collecting the light in real time, in the plasma processor which performs plasma processes such as etching, CVD, and ashing. <P>SOLUTION: The plasma processor includes: a plurality of shielding plates each of which has an opening portion and are mutually disposed so that part of light from the reaction chamber is projected on the optical window on a reaction chamber side than the optical widow; and a rotation portion for rotating the plurality of shielding plates at the same speed in the same direction. The shielding plate can be provided with a raised portion which extends in a radial direction in a plane, on the reaction chamber side. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010147036(A) 申请公布日期 2010.07.01
申请号 JP20080319061 申请日期 2008.12.16
申请人 SHIMADZU CORP 发明人 KOBAYASHI TOMOMITSU;IWAI NOBUYUKI
分类号 H01L21/3065;C23C16/44;H01L21/205;H01L21/31;H05H1/00;H05H1/46 主分类号 H01L21/3065
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