发明名称 SUBSTRATE HANDLING SYSTEM AND SUBSTRATE HANDLING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To carry a substrate at a high speed, while restraining vibration and deformation of the substrate. Ž<P>SOLUTION: This substrate handling system 1 has a carrying passage 20 for carrying a glass substrate G. The carrying passage 20 has a substrate floating device 25 for floatingly holding the glass substrate G on the carrying passage 20 by blowout and suction of air, and a driving mechanism 24 for moving the glass substrate G by holding the glass substrate G, and carries the glass substrate G in the carrying direction X while floatingly holding the glass substrate. This substrate handling system 1 can surely restrain damaging of a main surface of the glass substrate G even if the glass substrate G is carried at a high speed, and can put this glass substrate in a state of following the carrying passage 20 even if there is deformation in the glass substrate G, by restraining the vibration of the glass substrate G by high holding rigidity. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010143733(A) 申请公布日期 2010.07.01
申请号 JP20080324405 申请日期 2008.12.19
申请人 SUMITOMO HEAVY IND LTD 发明人 KOBAYASHI KENTARO;KAWACHI SHUNICHI
分类号 B65G49/06;B25J15/08;B65G51/03;H01L21/677 主分类号 B65G49/06
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