Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same

摘要

A polymer for gap-filling in a semiconductor device, the polymer being prepared by polycondensation of hydrolysates of the compound represented by Formula 1, the compound represented by Formula 2, and one or more compounds represented by Formulae 3 and 4: [RO]3Si—[CH2]n—Si[OR]3  (1) wherein n is from 0 to 2 and each R is independently a C1-C6 alkyl group; [RO]3Si—[CH2]nX  (2) wherein X is a C6-C12 aryl group, n is from 0 to 2, and R is a C1-C6 alkyl group; [RO]3Si—R′  (3) wherein R and R′ are independently a C1-C6 alkyl group; and [RO]3Si—H  (4) wherein R is a C1-C6 alkyl group.