| 摘要 |
<p>A sputtering target characterized by comprising: either cobalt and platinum or cobalt, chromium, and platinum; SiO2 and/or TiO2; and Co3O4 and/or CoO. By conducting sputtering using the sputtering target, a magnetic recording film having a granular structure and high coercive force can be formed. When the sputtering target is produced by sintering raw-material powders at 1,000ºC or lower, SiO2, TiO2, Co3O4, and CoO can be prevented from being reduced during the sintering. Thus, the sputtering target can be obtained as a more effective target.</p> |
