| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a degassing processing device of a vacuum treatment apparatus capable of simply adding the degassing function to the vacuum treatment apparatus without affecting the function thereof, and the vacuum treatment apparatus. Ž<P>SOLUTION: The degassing processing device 6 of the vacuum treatment apparatus 1 is connected to a vacuum chamber 2 for treating a workpiece W to remove the adsorption gas inside the vacuum chamber 2, and comprises: a heated gas feeding device 21 which communicates with a carrier gas source 36 of carrier gas for removing the adsorption gas, and heats the carrier gas and feeds it to the vacuum chamber 2; a gas treatment device 22 which sucks and treats the carrier gas after the reaction with the adsorption gas from the vacuum chamber 2; a gas feed pipe 23 for connecting the heated gas feeding device 21 to the vacuum chamber 2; and a gas exhaust pipe 24 for connecting the vacuum chamber 2 to the gas treatment device 22. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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