发明名称 |
ASSISTED DEPOSITION, NARROW TRENCH DAMASCENE PROCESS FOR MANUFACTURING A WRITE POLE OF A MAGNETIC WRITE HEAD |
摘要 |
A method for forming a magnetic write head using a damascene process that does not form voids in the magnetic structure. An opening is formed in an alumina layer, the opening being configured to define a trench. Then a first layer of magnetic material is deposited into the trench. A CMP process is then performed to remove any voids that have formed in the first magnetic layer. Then a second layer of magnetic material is deposited over the first layer of magnetic material. In another embodiment of the invention, a opening is formed in the alumina layer, and a first layer of magnetic material is electroplated into the opening. A thin layer of non-magnetic material is then deposited, and a second layer of magnetic material is deposited over the thin layer of non-magnetic material. The thin layer of alumina advantageously provides a laminate structure that avoids data erasure.
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申请公布号 |
US2010163422(A1) |
申请公布日期 |
2010.07.01 |
申请号 |
US20080345828 |
申请日期 |
2008.12.30 |
申请人 |
HSIAO WEN-CHIEN DAVID;LIU YINSHI;ZHENG YI |
发明人 |
HSIAO WEN-CHIEN DAVID;LIU YINSHI;ZHENG YI |
分类号 |
C25D5/02;B44C1/22;C23C14/04 |
主分类号 |
C25D5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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