发明名称 ASSISTED DEPOSITION, NARROW TRENCH DAMASCENE PROCESS FOR MANUFACTURING A WRITE POLE OF A MAGNETIC WRITE HEAD
摘要 A method for forming a magnetic write head using a damascene process that does not form voids in the magnetic structure. An opening is formed in an alumina layer, the opening being configured to define a trench. Then a first layer of magnetic material is deposited into the trench. A CMP process is then performed to remove any voids that have formed in the first magnetic layer. Then a second layer of magnetic material is deposited over the first layer of magnetic material. In another embodiment of the invention, a opening is formed in the alumina layer, and a first layer of magnetic material is electroplated into the opening. A thin layer of non-magnetic material is then deposited, and a second layer of magnetic material is deposited over the thin layer of non-magnetic material. The thin layer of alumina advantageously provides a laminate structure that avoids data erasure.
申请公布号 US2010163422(A1) 申请公布日期 2010.07.01
申请号 US20080345828 申请日期 2008.12.30
申请人 HSIAO WEN-CHIEN DAVID;LIU YINSHI;ZHENG YI 发明人 HSIAO WEN-CHIEN DAVID;LIU YINSHI;ZHENG YI
分类号 C25D5/02;B44C1/22;C23C14/04 主分类号 C25D5/02
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