发明名称 |
SELF-ASSEMBLED SIDEWALL SPACER |
摘要 |
A semiconductor structure is provided that includes a spacer directly abutting a topographic edge of at least one patterned material layer. The spacer is a non-removable polymeric block component of a self-assembled block copolymer. A method of forming such a semiconductor structure including the inventive spacer is also provided that utilizes self-assembled block copolymer technology. |
申请公布号 |
KR20100074159(A) |
申请公布日期 |
2010.07.01 |
申请号 |
KR20107006345 |
申请日期 |
2008.10.01 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DORIS BRUCE;RADENS CARL JOHN |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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