| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable use not only under ultraviolet light such as i-line or g-line but under excimer laser light of KrF or the like, an electron beam or a radiation such as X-rays, and to obtain a non-polymer type radiation sensitive resist having high sensitivity, high resolution, high heat resistance and solvent solubility by a simple production process. <P>SOLUTION: The invention relates to a radiation sensitive composition containing a compound for a resist prepared by introducing an acid-dissociable functional group into a flavonoid type polyphenol compound and an acid generator, and a radiation sensitive composition containing the compound for a resist in which the acid-dissociable functional group is a tert-butoxycarbonyloxy group and an acid generator. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
