发明名称 |
Method for manufacturing a resistive switching memory device |
摘要 |
<p>A method for manufacturing a resistive switching memory device (115) comprises providing a substrate (100) comprising an electrical contact (101), providing on the substrate (100) a dielectric layer (102) comprising a trench exposing the electrical contact (101), and providing in the trench at least the bottom electrode (103b) and the resistive switching element (140) of the resistive memory device (115). The method may furthermore comprise providing a top electrode (105) at least on or in the trench, in contact with the resistive switching element (140). The present invention also provides corresponding resistive switching memory devices (115).</p> |
申请公布号 |
EP2202816(A1) |
申请公布日期 |
2010.06.30 |
申请号 |
EP20090153091 |
申请日期 |
2009.02.18 |
申请人 |
IMEC |
发明人 |
LISONI REYES, JUDIT;GOUX, LUDOVIC;WOUTERS, DIRK |
分类号 |
H01L45/00;H01L27/24 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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