POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND

摘要

PURPOSE: A positive resist composition, a method for forming a resist pattern, and a novel polymer are provided to obtain excellent lithography properties including sensitivity to an exposed light source and a resolution. CONSTITUTION: A positive resist composition contains a base component having solubility to an alkali developer and an acid generator creating acid through exposure. The based component contains a polymer having a structure unit which is marked as a chemical formula 1. In the chemical formula 1, R1 is a hydrogen atom, an alkyl group, or halogenated alkyl group. A is a divalent straight chain or branched chain type aliphatic hydrocarbon group.