发明名称 |
Method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate |
摘要 |
A method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate is provided. The dual-layer photoresist includes a layer of black resin and a layer of transparent photoresist. The black resin, having an optical density greater than three, is mainly used to achieve the effect of black matrix. The transparent photoresist is mainly used to satisfy the needed cell gap between two transparent substrates.
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申请公布号 |
US7746443(B2) |
申请公布日期 |
2010.06.29 |
申请号 |
US20050257240 |
申请日期 |
2005.10.24 |
申请人 |
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发明人 |
LAN CHIH-CHIEH;HUNG HUNG-YI;WANG YU-FANG |
分类号 |
G02F1/13;G02F1/1335;G02F1/1339;G02F1/136 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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