| 摘要 |
<p>PURPOSE: A providing method of a photo-curable IPS material, and a providing method of a photo-curable substrate resist are provided to secure the improved cloning property by the high nano imprint lithographic process accuracy due to the low shrinkage rate of the process. CONSTITUTION: A providing method of a photo-curable IPS material comprises a step of moving a pattern from an adhesion preventing stamp to IPS. The method is capable of using for an imprinting method using the patterned IPS as a template for moving the pattern on a substrate resist. The IPS contains photo initiators capable of starting the polymerization, catalysts, mono-functional or multi-functional monomers capable of polymerizing, and fluorine-surfactants. An IPS material which is not cured contains polymerizable mono-functional or multi-functional monomers, and more than one free radical photo-initiator.</p> |
