发明名称 Pattern forming method and pattern forming system
摘要 Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
申请公布号 US7745237(B2) 申请公布日期 2010.06.29
申请号 US20070626402 申请日期 2007.01.24
申请人 HITACHI, LTD. 发明人 KATAGIRI SOUICHI;SOHDA YASUNARI;OGINO MASAHIKO
分类号 H01L21/66;G01R31/26;H01L21/461 主分类号 H01L21/66
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