发明名称 |
Pattern forming method and pattern forming system |
摘要 |
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
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申请公布号 |
US7745237(B2) |
申请公布日期 |
2010.06.29 |
申请号 |
US20070626402 |
申请日期 |
2007.01.24 |
申请人 |
HITACHI, LTD. |
发明人 |
KATAGIRI SOUICHI;SOHDA YASUNARI;OGINO MASAHIKO |
分类号 |
H01L21/66;G01R31/26;H01L21/461 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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