发明名称 Method and system for stencil design for particle beam writing
摘要 Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
申请公布号 US7747977(B1) 申请公布日期 2010.06.29
申请号 US20050226253 申请日期 2005.09.15
申请人 D2S, INC. 发明人 LAPANIK DMITRI;MATSUSHITA SHOHEI;MITSUHASHI TAKASHI;WU ZHIGANG
分类号 G06F17/50 主分类号 G06F17/50
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