| 摘要 |
PURPOSE: A substrate processing apparatus is provided to completely block the leakage of fumes and particles by forming an air generator on one sidewall of a housing to form a process chamber. CONSTITUTION: A processing chamber(10) forms a space for processing a substrate. A driving chamber(20) drives a roller brush(50). A plurality of transfer members transfers the substrate. A spray member supplies a chemical solution or cleaning solution on the substrate. An air generator(60) is positioned on one sidewall of the housing. The air generator blocks the fume or particle leaked through a penetration hole.
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