发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
摘要 <p>PURPOSE: A nonvolatile memory device and a manufacturing method thereof are provided to improve the integration of the nonvolatile memory device by simplifying the arrangement of a via plug and a word line. CONSTITUTION: A plurality of semiconductor pillars is formed on a substrate(105). A plurality of control gate electrodes(120) is stacked on the substrate to surround the semiconductor pillar. A plurality of dummy electrodes(125) is adjacently separated from the control gate electrode. A plurality of via plugs(170) is combined with the control gate electrode. A word line(180) is formed on the via plug. The via plug penetrates through one control gate electrode and a part of the dummy electrodes.</p>
申请公布号 KR20100071605(A) 申请公布日期 2010.06.29
申请号 KR20080130383 申请日期 2008.12.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 WENXU XIANYU;LEE, JUNG HYUN;MA, DONG JOON;KIM, YEON HEE;PARK, YONG YOUNG;LEE, CHANG SOO
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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