METHOD FOR MANUFACTURING METALNITRIDE AND APPARATUS FOR THE SAME

摘要

PURPOSE: A method and an apparatus for manufacturing a metal nitride layer are provided to manufacture the metal nitride layer in a low temperature process by providing the gas with plasma-nitrogen to a reaction space by using a remote plasma unit. CONSTITUTION: A chamber(100) has a reaction space. A substrate is received in a substrate receiving unit(10). Metal materials are supplied to the reaction space. The metal materials are purged by supplying a first purge gas to the reaction space. The gas with plasma-nitrogen is supplied to the reaction space. The gas with the nitrogen is purged by supplying a second purge gas to the reaction space. A metal nitride layer is formed on the substrate.