| 摘要 |
PURPOSE: A substrate cleaning apparatus is provided to supply a constant amount of deionized water and discharge etchant from the tank when the hydrogen peroxide inputted fro cleaning wiring materials is abnormally dissolved. CONSTITUTION: A tank(100) performs an etching process by an etchant and deionized water supplied from the outside. An etchant feed unit(200) supplies the etchant. A deionized water supply unit(300) supplies the deionized water. An etchant discharging unit(700) discharges the etchant. A monitoring unit(600) monitors the temperature of the tank. A controller(620) supplies the constant amount of deionized water to the tank.
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