SUBSTRATE SURFACE INSPECTING APPARATUS AND SUBSTRATE SURFACE INSPECTING METHOD

摘要

[PROBLEMS]To provide a substrate surface inspecting apparatus and method which enables judgment and analysis of the state of even the portions of a substrate supported by supports from captured images.[MEANS FOR SOLVING PROBLEMS]A substrate surface inspecting apparatus comprises a supporting mechanism (20) in which the arrangement of substrate supporting positions along a direction perpendicular to the scanning direction of a plurality of first supports (23a-23d) is set both outside the areas of a substrate (10) to be imaged by imaging units (30a, 30b) disposed in first relative positions and within the common areas to be imaged and the arrangement of substrate supporting positions along a direction perpendicular to the scanning direction of a plurality of second supports (24a-24d) is set both outside the areas of the substrate to be imaged by the imaging units disposed in second relative positions and within the common areas to be imaged. Using this supporting mechanism (20), the surface of the substrate (10) supported by the first supports is scanned and imaged by the imaging units disposed in the first relative position. Then, the imaging units are moved to the second relative positions, and the surface of the substrate (10) supported by the second supports is scanned and imaged by the imaging units disposed in the second relative positions.