| 摘要 |
PURPOSE: A method for detecting a weak point is provided to reduce time and costs of detecting the weak point by detecting the weak point of a full chip regardless of the size and shape of the pattern. CONSTITUTION: A target layout is designed(S100). The optical proximity effect about the target layout is compensated(S110). The target layout compensating the optical proximity effect is verified by using a NILS(Normalized Image Log Slope) of the target layout(S120). A reticle with the target layout is manufactured(S130). |
