发明名称 Resistive memory cell fabrication methods and devices
摘要 A phase change memory cell and methods of fabricating the same are presented. The memory cell includes a variable resistance region and a top and bottom electrode. The shapes of the variable resistance region and the top electrode are configured to evenly distribute a current with a generally hemispherical current density distribution around the first electrode.
申请公布号 US7745231(B2) 申请公布日期 2010.06.29
申请号 US20070785391 申请日期 2007.04.17
申请人 MICRON TECHNOLOGY, INC. 发明人 LIU JUN;VIOLETTE MIKE
分类号 H01L21/02 主分类号 H01L21/02
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