Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
申请公布号
NL2003919(A)
申请公布日期
2010.06.28
申请号
NL20092003919
申请日期
2009.12.08
申请人
ASML NETHERLANDS B.V.,
发明人
MOS, EVERHARDUS;FINDERS, JOZEF;MIDDLEBROOKS, SCOTT;WANGLI, DONGZI;MOL, CHRISTIANUS;DUSA, MIRCEA
