| 摘要 |
PURPOSE: A self ignition and a remote plasma device are provided to improve the accuracy and reliability of a cleaning process by selectively executing an end point detection control and a time control. CONSTITUTION: A first chamber(20) is a capacitance reactor type. The first chamber generates initial ionized gas by storing a part of inlet gas. A second chamber(30) mixes the rest of the inlet gas with the initial ionized gas. A third chamber(40,45) is an inductance furnace type. The third chamber generates remote plasma source after receiving the gas which is mixed in the second chamber. The inlet gas is divided into a uniform rate through a non-uniform distribution type inlet manifold(10).
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