| 摘要 |
PURPOSE: A plasma processing device is provided to efficiently cool a plasma generator by supplying a refrigerant to the plasma generator. CONSTITUTION: A reaction chamber provides a plasma generating space by integrating a lower chamber and an upper chamber. An insulator(300) is arranged on the upper side of an upper chamber. An antenna(400), built inside of the insulator, is applied high frequency power from the outside. A cooling unit(500) cools the insulator and the peripheral region of the insulator by supplying a flow through a flow path. The flow path(310) is arranged in a concentric circle within the insulator. |
