发明名称 APPARATUS AND METHOD FOR REMOVING FOREIGN SUBSTANCE, AND STORAGE MEDIUM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for removing foreign substance capable of optimizing an input heat quantity into a treatment object substrate to eliminate wasteful heating, and reducing a treatment time by eliminating a wasteful treatment. <P>SOLUTION: This method for removing foreign substance includes: a measuring laser light irradiation step of irradiating a treatment object substrate with laser light for outer diameter size measurement; an output detection step of detecting the output of the laser light by receiving residual laser light excluding laser light interrupted by an end of the substrate out of the measuring laser light; a rotation angle detection step of detecting the rotation angle of a rotating substrate; a calculation step of calculating the outer diameter size of the substrate based on data detected in the output detection step and data detected in the rotation angle detection step; and a decomposition step of decomposing and removing foreign substance adhering to a surface of the substrate in a predetermined range by irradiating the surface of the substrate in the predetermined range with foreign substance-cleaning laser light having a rectangular irradiation cross section from an outer peripheral end of the substrate based on the calculated outer diameter size, and spraying a treatment gas reacting with the foreign substance thereto. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010141238(A) 申请公布日期 2010.06.24
申请号 JP20080318237 申请日期 2008.12.15
申请人 TOKYO ELECTRON LTD 发明人 KONDO MASAKI;SHINDO TAKEHIRO
分类号 H01L21/3065;H01L21/302;H01L21/304;H01L21/683 主分类号 H01L21/3065
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