发明名称 ELECTRON BEAM DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To stably observe a testpiece which is hard to take an electric contact with charged particles. Ž<P>SOLUTION: The electron beam device is provided with a testpiece retaining pallet to take an electric contact with a measured testpiece and a testpiece retaining pallet not to take an electric contact, and a pallet is selected according to the measured testpiece. Further, a difference between a measured voltage potential of the testpiece in vacuum and a predicted voltage potential based on the measured potential of the testpiece measured in the atmosphere is memorized as a voltage potential offset and is fed back to the latter measurement. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010140733(A) 申请公布日期 2010.06.24
申请号 JP20080315292 申请日期 2008.12.11
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 HAYATA YASUNARI;YAMANASHI HIROMASA;FUKUDA MUNEYUKI;OHASHI KENYOSHI
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
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