| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum deposition apparatus which can form a film having uniform film thickness on a member, for example, having a large curvature and a large diameter. <P>SOLUTION: The vacuum deposition apparatus includes: a mechanism 20 for supporting a member 10, rotating the member 10 around a first axis 14 passing through the center thereof, and revolving the member 10 around a second axis 15 which is different from the first axis 14; an evaporation source 12 which is arranged spaced apart from the second axis 15 and generates deposition particles for forming the film; and n pieces of shield 17 (wherein, n is an integer of 2 or more) which are arranged between the member 10 which is rotated and revolved by the mechanism 20 and the evaporation source 12 and shield the adhesion of the deposition particles to the member 10 which is rotated and revolved. When the amount of shielding of the adhesion of the deposition particles to the member 10 which is rotated and revolved by each of the n pieces of shield 17 is defined as Ai (wherein, i=1-n), each of Ai satisfies the formula: Ai=(A1+A2+ ... +An)×(1/n±1/5n). <P>COPYRIGHT: (C)2010,JPO&INPIT |
