| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve overall productivity in a production line environment where a plurality of types of semiconductor device, process flows and manufacturing devices are mixed, in relation to a semiconductor production control system. <P>SOLUTION: Manufacturing devices installable on a process basis are related to one another in a process flow of a semiconductor product (lot) basis. In this production control system, preparation of lots and members (reticles) and scheduling are controlled by aiming at a set of, for instance, an exposure process (anterior process) and an etching process (posterior process) within a plurality of processes and manufacturing devices of a line. The system controls the processing start to the exposure device of the anterior process by efficient preparation of the lots and the members based on calculation of the numbers (N1, N2) of target processing starts based on actual processing starts of the devices of each process and understanding of loads. Thereby, the number (N2) of target processing starts of the etching device is achieved by delivering lots of a required number of processing starts to the etching device of the posterior process. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
