发明名称 |
Composition for simultaneously forming two isolated column spacer patterns |
摘要 |
A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
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申请公布号 |
US2010160477(A1) |
申请公布日期 |
2010.06.24 |
申请号 |
US20090654583 |
申请日期 |
2009.12.23 |
申请人 |
CHO CHANG HO;LEE KEON WOO;KIM SUNG HYUN;KWAK SANG KYU;OH DONG KUNG;LEE CHANG SOON |
发明人 |
CHO CHANG HO;LEE KEON WOO;KIM SUNG HYUN;KWAK SANG KYU;OH DONG KUNG;LEE CHANG SOON |
分类号 |
C08J3/28 |
主分类号 |
C08J3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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