发明名称 SAMPLE PLACEMENT MECHANISM OF ASSAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a sample placement mechanism of an assay device which is able to quickly make the inside of a vacuum case into a high-vacuum state. Ž<P>SOLUTION: The sample placement mechanism 20 is a sample placement mechanism of the assay device which ionizes a sample under vacuum and detects the resulting generated ions for analyzing the sample. A sample support 200 for placing the sample S is connected with a driving means 210, located outside the vacuum case (inside the first chamber 21). The sample support 200 is inserted in the vacuum case (the first chamber 21), and the insertion portion of the support 200 to the vacuum vessel (the first chamber 21) is sealed with a sealing member 217. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010139453(A) 申请公布日期 2010.06.24
申请号 JP20080317859 申请日期 2008.12.15
申请人 YAMATAKE CORP 发明人 WATANABE HIROSHI
分类号 G01N1/00;G01N27/62 主分类号 G01N1/00
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