| 摘要 |
The invention relates to a method of making a planographic printing plate comprising a substrate having thereon one or more layers of a radiation-sensitive metal oxide, sulfide or nitride and excluding an organic hydrophobic material or a binder within or above a radiation-sensitive layer, the method comprising depositing the one or more layers of the radiation-sensitive metal oxide, sulfide or nitride by vapour deposition and exposing the one or more layers without that exposure causing ablative effect. Preferably the compound, and in particular a metal oxide, such as titanium dioxide, is deposited by atomic layer deposition at atmospheric pressure and at a temperature of from 20° C. to 300° C. at a layer thickness of less than 100 nm. The substrate can be any planar material, preferably with the potential to be flexible and with a surface that can be roughened or textured. No binder is required to adhere the metal compound to the printing plate and no processing or chemicals are required in the preparation of the plate.
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