发明名称 Method for Fabricating Cylinder Type Capacitor
摘要 A method for fabricating a cylinder type capacitor includes forming connection contacts passing through a lower layer over a semiconductor substrate; forming a mold layer covering the connection contacts; forming a first floated pinning layer with a stress in a first direction over the mold layer; forming a second floated pinning layer for stress relief with a stress in a second direction over the first floated pinning layer, said second direction being opposite to the first direction; forming opening holes passing through the first and second floated pinning layers and the mold layer and exposing the connection contacts; forming storage nodes following a profile of the opening holes; removing portions of the first and second floated pinning layers to form a floated pinning layer pattern, the floated pinning layer pattern exposing a portion of the mold layer and contacting upper tips of the storage nodes; exposing outer walls of the storage nodes by selectively removing the exposed mold layer; and forming a dielectric layer and an upper electrode over the storage node.
申请公布号 US2010159700(A1) 申请公布日期 2010.06.24
申请号 US20090492905 申请日期 2009.06.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 EUN BYUNG SOO
分类号 H01L21/306 主分类号 H01L21/306
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