| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pulse power supply means, suitable for application in a laser-assisted DPP-system extreme-ultraviolet light source device capable of increasing the average output by increasing the repetition frequency. <P>SOLUTION: When a switch SW is put on to have a first magnetic switch SR0 saturated to go into an on-state, energy is transferred from a first capacitor C0 to a second capacitor C1 to have the second capacitor C1 charged. Electrodes 1a, 1b are coated, for instance, with a high-temperature plasma raw material as an EUV-generating species. On the raw material, laser beams 2a are irradiated from a laser device (energy beam irradiation means) 2 to have the raw material vaporized to generate discharge by voltage charged on the capacitor C1, and to have the vaporized material heated and excited and generate a high-temperature plasma. Since transformers are not provided at the pulse power supply means and circuit elements for delaying circuit operation is decreased, the repetition frequency can be increased. <P>COPYRIGHT: (C)2010,JPO&INPIT |
