发明名称 ALKALI DEVELOPER FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING AND PLATE MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an alkali developer for photosensitive lithographic printing most suitable for developing a negative photosensitive lithographic printing plate having an aluminum support not subjected to silicate treatment. <P>SOLUTION: The alkali developer for photosensitive lithographic printing contains, based on the total mass of the developer, 0.2-5 mass% (in terms of solid content) of benzyl alcohol (a), 0.2-1.5 mass% (in terms of solid content) of a tetraalkylammonium hydroxide (b), and a polyoxyalkylene non-aryl type anionic surfactant (c). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010139551(A) 申请公布日期 2010.06.24
申请号 JP20080313292 申请日期 2008.12.09
申请人 NIPPE GRAPHICS KK 发明人 UMEMOTO HIROTOSHI;KONISHI KATSUJI
分类号 G03F7/32;G03F7/00;G03F7/004;G03F7/027;G03F7/09 主分类号 G03F7/32
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