| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum device, a light source device, an exposure device, and a device manufacturing method which can suppress the temperature changes in a chamber and reduce the pressure to vacuum atmosphere inside the chamber. <P>SOLUTION: The vacuum device connected the a chamber 15, in which a pressure is reduced to a vacuum atmosphere, includes a vacuum pump 34 that reduces the pressure in the chamber 15 or in a connecting part 36 that communicates with the inside of the chamber 15, and a radiation reducing unit 46 that is disposed on a predetermined surface near the vacuum pump 34 and reduces the thermal radiation from the vacuum pump 34 into the chamber 15, wherein the formation of the radiation reducing unit 46 depends on a first region, having a relatively high thermal radiation and a second region having a relatively low thermal radiation on the predetermined surface. <P>COPYRIGHT: (C)2010,JPO&INPIT |
