ANTIREFLECTIVE COATING FORMING MATERIAL, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an organic antireflection forming material that is deposited in the same process as the conventional art, effectively prevents reflection of exposure light with an antireflective coating, has high dry etching speed, and is useful for forming a fine pattern.

SOLUTION: This antireflection coating forming material contains one or more kinds of high molecular compound (A) that has: one or more kinds of repeating units represented by a general formula (1); an extinction coefficient (k value) of 0.01 to 0.4 in exposure wavelength; and a refractive index (n value) of 1.4-2.1, and high molecular compound (B) that has: an aromatic ring; and an extinction coefficient (k value) of 0.3 to 1.2 in an exposure wavelength.

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