SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR MANUFACTURING METHOD, AND ELECTRONIC DEVICE

摘要

[PROBLEMS] To form a film enabling prevention of ion diffusion and having good adhesion to a glass substrate. [MEANS FOR SOLVING PROBLEMS] A semiconductor manufacturing apparatus comprises first introducing means for introducing a non-excited semiconductor gas into a chamber and a second introducing means for introducing an excited non-semiconductor gas into the chamber. The first introducing means has a first gas supply pipe extending from a cylinder in which the semiconductor gas is stored not through a remote plasma apparatus directly to the chamber. The second introducing means has a second gas supply pipe extending from a cylinder in which the non-semiconductor gas is stored through the remote plasma apparatus to the chamber.