| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alternate method and apparatus improved in resolution. <P>SOLUTION: A lithography projection apparatus includes a projection system to project a patterned beam onto a substrate, and a liquid supply system to supply liquid between a final element of the projection system and the substrate. The liquid supply system includes a hydrophobic surface to confine the liquid in a reservoir formed around imaging field of the projection system. <P>COPYRIGHT: (C)2010,JPO&INPIT |
