发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.
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申请公布号 |
US2010157277(A1) |
申请公布日期 |
2010.06.24 |
申请号 |
US20100718112 |
申请日期 |
2010.03.05 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KEMPER NICOLAAS RUDOLF;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;VAN DER MEULEN FRITS |
分类号 |
G03B27/60;G03B27/32 |
主分类号 |
G03B27/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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