| 摘要 |
A gas barrier thin film having a substrate, an anchoring layer, and an inorganic oxide layer, the anchoring layer including a silicon-containing organic-inorganic composite copolymer comprising a repeating unit of the formula—(SiO)n—, a repeating unit of the formula—(SiR1R2—NR3)m—, and at least one or a combination of repeating units of the formulas wherein at least one of R1, R2, and R3 is independently hydrogen, R1, R2, and R3 are each independently C1-C5 alkyl, C2-C5 alkenyl, C2-C5 alkynyl, C1-C5 alkoxyl, or C6-C15 aryl, R4, R5, R6, and R7 are each independently hydrogen, C1-C3 alkyl, C1-C3 alkoxyl, C3-C10 cycloalkyl, or C6-C15 aryl, R4 and R5 are not simultaneously hydrogen, R6 and R7 are not simultaneously hydrogen, n+m+r=1, 0<n<1, 0<m<1, and 0<r<1,‘n’,‘m’, and‘r’are each a molar ratio,‘r’is p, q, or p+q, and a degree of polymerization is about 1,000 to about 1,000,000.
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