发明名称 Exposure data generation method and device, exposure data verification method and device and storage medium
摘要 Exposure verification is applied to exposure data indicating a pattern to be exposed by a charged particle beam. If an error point is extracted from the exposure data by the exposure verification, the values of coefficients are modified and exposure data is regenerated taking into consideration the coefficients whose values have been modified. Thus, exposure data is re-generated by changing each of the coefficient values within its appropriate range.
申请公布号 US2010162198(A1) 申请公布日期 2010.06.24
申请号 US20100719207 申请日期 2010.03.08
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 OGINO KOZO
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
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